CK300 Three-target Magnetron Sputtering Coating System: A High-performance Scientific Research-grade Thin Film Preparation Solution

1. Equipment Overview and Applications The CK300 Triple-Target Magnetron Sputtering Coating System is a high-end vacuum coating device specifically designed for universities, research institutes, and laboratories. It is widely used in the preparation of novel thin-film materials, including nano-scale single-layer and multilayer functional films, hard films, metal films, semiconductor films, and dielectric films. Whether for basic research or small-scale prototyping, the CK300 delivers exceptional coating quality and process stability.

II. Core Features Highlights

· Triple-target synergy: Featuring three 3-inch permanent magnet magnetron sputtering targets (2 standard magnetic fields + 1 high magnetic field), it supports dual-mode switching between DC and RF to accommodate diverse material deposition requirements.

· Double cleaning technology:

o Anode layer ion source: used for deep cleaning of sample before plating and auxiliary deposition during the plating process, which significantly improves the adhesion of the film layer.

o The back-sputtering cleaning function can be used to clean the sample in situ before coating, to remove the surface oxide layer and impurities, and to ensure the bonding force of the film base.

· Precision process control: Equipped with two independent MKS mass flow controllers, it enables precise ratio adjustment and gas mixing between reaction gas and argon, with real-time adjustable and controllable chamber pressure.

III. Technical Parameters and Specifications

· vacuum performance ：

o Extreme vacuum: ≤5×10⁻⁵ Pa

o Working vacuum: up to 5×10⁻⁴ Pa

o Pressure rise rate: ≤10 Pa after 12 hours of pump shutdown

o System leakage rate: ≤5×10⁻⁷ Pa·L/S

· Power configuration: Equipped with three 600W,13.56MHz RF power supplies, featuring automatic matching to ensure stable discharge.

· architectural design ：

o The single-chamber D-type front-opening door structure is made of stainless steel, facilitating convenient sample exchange operations.

o The distance between the target and the sample can be adjusted from 40 mm to 120 mm.

o The design of the built-in liner can prevent the sputtering material from contaminating the wall of the vacuum chamber.

· Temperature control and safety:

o Infrared heating is used for deaeration and baking, with a maximum temperature of 150°C.

o It features interlock protection against power and water outages and error-proofing functions to ensure equipment and personnel safety.

4. Why Choose CK300?

The CK300 three-target magnetron sputtering coating system has become a trusted tool in thin-film material research, featuring high vacuum performance, flexible three-target configuration, and advanced ion-assisted technology. Its compact design and user-friendly operation not only lowers experimental barriers but also significantly enhances research efficiency and coating quality.